System and method for particle control in mram processing

ABSTRACT

A system and method for reducing particle contamination on substrates during a deposition process using a particle control system is disclosed here. In one embodiment, a film deposition system includes: a processing chamber sealable to create a pressurized environment and configured to contain a plasma, a target and a substrate in the pressurized environment; and a particle control unit, wherein the particle control unit is configured to provide an external force to each of at least one charged atom and at least one contamination particle in the plasma, wherein the at least one charged atom and the at last one contamination particle are generated by the target when it is in direct contact with the plasma, wherein the external force is configured to direct the at least one charged atom to a top surface of the substrate and to direct the at least one contamination particle away from the top surface of the substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of U.S. patent applicationSer. No. 16/530,392, filed on Aug. 2, 2019, which claims priority toU.S. Provisional Patent Application No. 62/718,050, filed on Aug. 13,2018, each of which is incorporated by reference herein in its entirety.

BACKGROUND

Magnetoresistive random-access memory (MRAM) is a non-volatilerandom-access memory technology and typically, such memory is fabricatedby depositing multiple layers of materials using a physical vapordeposition system under vacuum. During deposition, the multiple layersof materials can be contaminated by system- or process-relatedcontamination. One of the primary types of contamination istarget-related, such as particles (e.g., flakes) from a surface of atarget. This target-related contamination is typically caused by arcing,non-homogeneity in morphology and composition, etc. These particles inthe deposited film can affect the film growth, its properties, as wellas device performance adversely. Therefore, a method and system that caneffectively prevent particle contamination during a film depositionprocess is needed. Despite this long felt need, no suitable systemsmeeting these requirements are available.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that various features are not necessarily drawn to scale. In fact,the dimensions and geometries of the various features may be arbitrarilyincreased or reduced for clarity of illustration.

FIG. 1A illustrates a cross-sectional view of a physical vapordeposition system with a particle control system, in accordance withsome embodiments of the present disclosure.

FIG. 1B illustrates a top-view of a physical vapor deposition systemwith a particle control system, in accordance with some embodiments ofthe present disclosure.

FIG. 2A illustrates a cross-sectional view of a physical vapordeposition system with a particle control system, in accordance withsome embodiments of the present disclosure.

FIG. 2B illustrates a top-view of a physical vapor deposition systemwith a particle control system, in accordance with some embodiments ofthe present disclosure.

FIG. 3 illustrates a flowchart of a method for removing contaminationparticles using a particle control system in a physical vapor depositionprocess, in accordance with some embodiments of the present disclosure.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

The following disclosure describes various exemplary embodiments forimplementing different features of the subject matter. Specific examplesof components and arrangements are described below to simplify thepresent disclosure. These are, of course, merely examples and are notintended to be limiting. For example, it will be understood that when anelement is referred to as being “connected to” or “coupled to” anotherelement, it may be directly connected to or coupled to the otherelement, or one or more intervening elements may be present.

The presented disclosure provides various embodiments of a method andsystem for removing particle contamination on a substrate during a filmdeposition process. During deposition, the multiple layers of materialscan be contaminated by system- or process-related contamination. One ofthe primary types of contamination is target-related, such as particles(e.g., flakes) from a surface of a target. This target-relatedcontamination is typically caused by arcing, non-homogeneity inmorphology and composition, etc. These particles in the deposited filmcan affect the film growth, its properties, as well as deviceperformance adversely. A system and method to effectively removeparticle contamination during a deposition process is presented.Accordingly, the above-mentioned issues may be advantageously avoided.

This description of the exemplary embodiments is set to be understood inconnection with the figures of the accompanying drawing, which are to beconsidered part of the entire written description. In the description,relative terms such as “lower,” “upper,” “horizontal,” “vertical,”“above,” “below,” “up,” “down,” “top” and “bottom” as well asderivatives thereof (e.g., “horizontally,” “downwardly,” “upwardly,”etc.) should be construed to refer to the orientation as then describedor as shown in the drawing under discussion. These relative terms arefor convenience of description and do not require that the apparatus beconstructed or operated in a particular orientation.

FIG. 1A illustrates a cross-sectional view of a physical vapordeposition system 100 with a particle control system 160, in accordancewith some embodiments of the present disclosure. The processing chamber102 comprises at least one target 104 bonded on at least one plasmacathode 106. In the illustrated embodiment, at least one gas-feedingport 120 connected to at least one gas supply line (not shown), and atleast one vacuum port 122 connected to a pressure control unit, e.g., apump and a pressure gauge. In some embodiments, the pressure controlunit is able to provide an environment in the processing chamber 102with a pressure of a few millitorr (mTorr) to a few Torr.

In some embodiments, gas through the at least one gas-feeding port 120to the processing chamber 102 may include at least one or a combinationof O₂, Ar, N₂, H₂, NH₃, N₂O, CF₄, SF₆, CCl₄, CH₄, H₂S, SiH₄,metal-containing precursors, etc. For example, process gas (e.g., Ar) isadded to the processing chamber 102 through the at least one gas-feedingport 120 and pumped out by a pump through the at least one vacuum port122. In some embodiments, the at least one gas-feeding port 120 can belocated in close proximity to the target 104 (e.g., behind the cathode).The at least one plasma cathode 106 each is coupled to a power source112. In some other embodiments, the power source 112 comprises a radiofrequency (RF) power source and a respective matching circuit (both arenot shown) operating at frequencies from a few tens of kilohertz (KHz)to tens of megahertz (MHz). By applying a power on the at least oneplasma cathode 106, a plasma 128 (i.e., a gas that contains ionizedatoms or molecules) can be formed in a space in the processing chamber102 near the at least one target 104. In some embodiments, technologies,such as for instance inductively coupled plasma, electron cyclotronresonance, microwave, and helicon wave can be integrated with the RFsource for a creation of high-density discharges for desired depositionproperties. In some embodiments, the physical vapor deposition system100 can be a DC magnetron sputtering system configured in a cathodetarget/anodic shield arrangement, wherein the at least one plasmacathode 106 and anode (not shown) are connected to a DC discharge powersupply 112. In some embodiments, the at least one target 104 and the atleast one corresponding plasma cathode 106 can be cooled by a coolantrunning behind the target 104.

In the illustrated embodiment, the processing chamber 102 furthercomprises a wafer stage 110 with a substrate 108. In some embodiments,the wafer stage 110 is further coupled to a power source 114 in order toattract positively charged particles 124 in the plasma 128 bombarded offthe surface of the target 104 by charged processing gas molecules (e.g.,Ar⁺). The back of the wafer stage 110 can be coupled to electricalground, in some embodiments. In some embodiments, the wafer stage 110 isalso coupled to the power source 114, e.g., an RF power source 114. Byapplying an AC voltage between the plasma cathode 106 and the waferstage 110, the plasma 128 can be formed on the target 104 and may extendacross the space between the target 104 and the wafer stage 110 to thesurface of the substrate 108, in accordance with some embodiments. Theprocessing chamber 102 may further comprise induction coils 116 which iscoupled to an RF power source 118 to create a magnetic field along they-axis of the processing chamber 102 so as to facilitate the formationof the plasma 128.

Although not shown in the figure, for the ones with ordinary skill inthe art it is understandable that the processing chamber 102 may be alsoequipped with a plurality of pressure gauges, thickness monitor systems(quartz crystal monitor, spectroscopic ellipsometer, reflectionhigh-energy electron diffraction detector (RHEED)), shutters, arotational manipulator, viewports, transfer ports, etc.

In some embodiments, the processing chamber 102 further comprises aparticle control system 160. In some embodiments, the particle controlsystem 160 comprises at least one magnet pair 130 configured inside theprocessing chamber 102. In some embodiments, the at least one magnetpair 130 each comprises two electromagnets 130A and 130B with magneticcoils configured facing each other on the opposite side of theprocessing chamber 102. Each of the electromagnets in a magnet pair 130comprise a conductive wire coil that acts as a magnet when an electriccurrent passes through it. In some embodiments, the conductive wire coilis wrapped around a core of ferromagnetic materials which can be used toenhance the magnetic field produced by the coil. In some embodiments,the at least one magnet pair 130 is coupled to a power source 138 andfurther to a control unit 140. In some embodiments, the control unit 140and the power source 138 are configured to control a magnitude and adirection of an electric current running through the magnetic coils ofthe two electromagnets 130A/130B in each of the at least one magnet pair130 so as to adjust a strength and a direction of the magnetic field 132between the 2 electromagnets in the magnet pair 130. A magnetic force isinduced by the magnetic field 132 on moving and charged particles (e.g.,the positively charged particle 124) from the target 104. For example, apositively charged target atom 124 for deposition on the substrate 108and a positively charged contamination particle 126 are bombarded offthe surface of the target 104. In some embodiments, the positivelycharged target atom 124 and the positively charged contaminationparticle 126 each has an initial trajectory 146 without the magneticfield 132 provided by the magnet pair 130 of the particle control system160. When the magnetic field 132 with a direction from a firstelectromagnet 130A to a second electromagnet 130B is enabled, thepositively charged target atom 124 and the positively chargedcontamination particle 126 each has a second trajectory 134 and 136,respectively. In some embodiments, the second trajectory 134/136 arecaused by the electromagnetic force applied on the particles 124/126.The difference between the original trajectory and the second trajectoryis greater on the positively charged target atom 124 than that of thepositively charged contamination particle 126 caused by differencesbetween the two particles, for example mass and electric charge.Therefore, the magnetic force can change original trajectories ofcharged particles and thus separate contamination particles from therest of the target atoms 124 so as to reduce the contamination in thedeposited film.

In some other embodiments, the at least one magnet pair 130 comprises apair of permanent magnets. In some embodiments, the permanent magnetscomprises ferromagnetic materials that can produce persistent magneticfield.

Referring to FIG. 1A, the wafer stage 110 in the physical vapordeposition system 100 is positioned off the center of the processingchamber 102. In some embodiments, the wafer stage 110 is coupled to amechanical transfer arm 148. The mechanical transfer arm 148 coupled tothe wafer stage 110 can be controlled by a control unit 150 so as toadjust the position of the wafer stage 110 in the processing chamber 102according to positions of target atoms.

The wafer stage 110 in the physical vapor deposition system 100 canfurther equipped with a plurality of temperature control elements 142.The temperature control elements 142 are controlled by a temperaturecontrol unit 144. The temperature control unit 144 can be located withina processing chamber 102 enclosed in a Faraday shield to protectelectronic circuits from RF interference or outside the processingchamber 102.

According to the exemplary embodiment described herein, the physicalvapor deposition system 100 can be used in processing the surface layersof the substrate 108. For example, any of a photoresist layer, masklayer, or other layer of a semiconductor wafer as desired, can beprocessed before or after an etch step, or any combination thereof,according to a specified recipe. The recipe also specifies parametersused to establish the proper environment in the processing chamber 102for realizing the desired features and feature dimensions on thesubstrate 108. The recipe can specify a type of reactant gas to beintroduced into the plasma chamber and its flow rate, a pressure duringreaction, a power and frequency of the RF signal provided to the plasmacathode 106 or the wafer stage 110.

The substrate 108 may be a bulk silicon substrate although othersemiconductor materials including group III, group IV, and group Velements may also be used. Alternatively, the substrate may be asilicon-on-insulator (SOI) substrate. In some embodiments, a devicelayer may be a polysilicon layer disposed on a substrate (not shown) forthe formation of one or more polysilicon gates in the substrate 108. Inanother embodiment, the device layer may be a metallization layer suchas an inter-layer dielectric (ILD) or an inter-metal dielectric layer(IMD) for forming interconnect structures (e.g., metal lines and/orvias). In yet other embodiments, the device layer may be any layer inthe substrate 108 that may be patterned using photolithography andetching processes. The substrate 108 may include numerous device layers.Furthermore, the device layer may include a buffer layer (e.g., an oxideinterfacial layer, not shown), an etch stop layer (e.g., a siliconnitride layer, a silicon carbide layer, or the like), or the like. Ahard mask may be formed over the device layer for use as a patterningmask. The hard mask may comprise an oxide, silicon oxynitride (SiON),silicon nitride (Si₃N₄), titanium nitride (TiN), or the like.

FIG. 1B illustrates a top-view of a physical vapor deposition system 100with a particle control system 160, in accordance with some embodimentsof the present disclosure. In the illustrated embodiment, the particlecontrol system 160 in a processing chamber 102 comprises three magneticpairs, 130-1, 130-2 and 130-3. Although the deposition system 100comprises 3 magnetic pairs, it should be noted that the system 100 cancomprise any number of magnetic pairs which is within the scope of thisinvention. In some embodiments, the three magnetic pairs 130 eachcomprises two electromagnetic coils, e.g., 130-1A and 130-1B. In someembodiments, each of the electromagnetic coils has a circular shape or asquare shape. In some embodiments, the processing chamber 102 has adiameter of 50-60 centimeters. In some embodiments, each of theelectromagnetic coils comprises 10-20 turns and a diameter in a range of30-40 centimeters. In some embodiments, the electromagnetic coil eachcomprises at least one of the following metals: iron and manganese. Insome embodiments, the 3 magnet pairs 130 are arranged around the innerwall of the processing chamber 102 and each of the 3 magnetic pairs 130has a 2-fold rotational symmetry about the center of the processingchamber 102. In some embodiments, the system 100 comprises at least onetarget 104 at the center of the processing chamber 102. In someembodiments, the system 100 further comprises a wafer stage 110 with asubstrate 108. In some embodiments, the wafer stage 110 is off thecenter of the processing chamber 102 and located at the top of theprocessing chamber in a top view so as to collect positively chargedtarget atoms 124 that are shifted by the magnetic field 132 generated bythe 3 magnet pairs 130.

FIG. 2A illustrates a cross-sectional overview of a physical vapordeposition system 100 with a particle control system, in accordance withsome embodiments of the present disclosure. The processing chamber 102comprises at least one target 104 bonded on at least one plasma cathode106. In the illustrated embodiment, at least one gas-feeding port 120connected to at least one gas supply line (not shown), and at least onevacuum port 122 connected to a pressure control unit, e.g., a pump and apressure gauge. In some embodiments, the pressure control unit is ableto provide an environment in the processing chamber 102 with a pressureof a few millitorr (mTorr) to a few Torr.

In some embodiments, the gas through the gas-feeding port 120 to theprocessing chamber 102 may include at least one or a combination of O₂,Ar, N₂, H₂, NH₃, N₂O, CF₄, SF₆, CCl₄, CH₄, H₂S, SiH₄, metal-containingprecursors, etc. For example, process gas (e.g., Ar) is added to theprocessing chamber through the at least one gas-feeding port 120 andpumped out by a pump through the at least one vacuum port 122. In someembodiments, the at least one gas-feeding port 120 can be located inclose proximity to the target 104 (e.g., behind the cathode). The atleast one plasma cathode 106 each is coupled to a discharge power source112. In some other embodiments, the discharge power source 112 comprisesa radio frequency (RF) power source and a respective matching circuit(both are not shown) operating at frequencies from a few tens ofkilohertz (KHz) to tens of megahertz (MHz). By applying a power on theat least one plasma cathode 106, a plasma 128 (i.e., a gas that containsionized atoms or molecules) can be formed in a space in the processingchamber 102 near the at least one target 104. In some embodiments,technologies, such as for instance inductively coupled plasma, electroncyclotron resonance, microwave, and helicon wave can be integrated withthe RF source for a creation of high-density discharges for desireddeposition properties. In some embodiments, the physical vapordeposition system 100 can be a DC magnetron sputtering system configuredin a cathode target/anodic shield arrangement, wherein the at least oneplasma cathode 106 and anode (not shown) are connected to a DC dischargepower supply 112. In some embodiments, the at least one target 104 andthe at least one corresponding plasma cathode 106 can be cooled by acoolant running behind the target 104.

In the illustrated embodiment, the processing chamber 102 furthercomprises a wafer stage 110 with a substrate 108. In some embodiments,the wafer stage 110 is further coupled to a power source 114 in order toattract positively charged particles 124 in the plasma 128 bombarded offthe surface of the target 104 by charged processing gas molecules (e.g.,Ar⁺). The back of the wafer stage 110 can be coupled to electricalground, in some embodiments. In some embodiments, the wafer stage 110 isalso coupled to the power source 114, e.g., an RF power source 114. Byapplying an AC voltage between the plasma cathode 106 and the waferstage 110, the plasma 128 can be formed on the target 104 and may extendacross the space between the target 104 and the wafer stage 110 to thesurface of the substrate 108, in accordance with some embodiments. Theprocessing chamber 102 may further comprise induction coils 116 which iscoupled to an RF power source 118 to create a magnetic field along they-axis of the processing chamber 102 so as to facilitate the formationof the plasma 128.

Although not shown in the figure, for the ones with ordinary skill inthe art it is understandable that the processing chamber 102 may be alsoequipped with a plurality of pressure gauges, thickness monitor systems(quartz crystal monitor, spectroscopic ellipsometer, reflectionhigh-energy electron diffraction detector (RHEED)), shutters, arotational manipulator, viewports, transfer ports, etc.

In some embodiments, the particle control system 160 comprises at leastone electrode pair 202 configured inside the processing chamber 102. Insome embodiments, the at least one electrode pair 202 each comprises twoelectrodes 202A and 202B with electrodes configured facing each other onthe opposite side of the processing chamber 102. Each of the electrodepair 202 acts as a capacitor when an electric potential is appliedbetween the two electrodes. In some embodiments, the at least oneelectrode pair 202 is coupled to a power source 204 and further to acontrol unit 208. In some embodiments, the control unit 208 and thepower source 204 are configured to control a magnitude and a polarity ofthe electric potential so as to control a strength and a direction of anelectric field 206 between the two electrodes 202A/202B. Anelectrostatic force is induced by the electric field 206 on a moving andcharged particle (e.g., a positively charged target atom 124 and apositively charged contamination particle 126) from the target 104. Forexample, the positively charged target atom 124 for deposition on thesubstrate 108 and the positively charged contamination particle 126 arebombarded off the surface of the target 104. In some embodiments, thepositively charged target atom 124 and the positively chargedcontamination particle 126 each has an initial trajectory 146 when thereis no electric field 206 applied between the two electrodes 202A/202B.When the electric field 206 with a direction from a first electrode 202Ato a second electrode 202B is enabled by applying an electric potentialon the 2 electrodes 202A/202B, the positively charged target atom 124and the positively charged contamination particle 126 are shifted by theelectrostatic force resulting in second trajectories 134 and 136,respectively. The difference between the original trajectory and thesecond trajectory of the positively charged target atom 124 is greaterthan that of the positively charged contamination particle 126 caused bydifferences between the 2 particles, for example mass and electriccharges. Therefore, the electrostatic force provided by the particlecontrol system 160 can change original trajectories of charged particlesand thus separate contamination particles 126 from the rest of thetarget atoms 124.

Referring to FIG. 2A, the wafer stage 110 in the physical vapordeposition system 100 is positioned off the center of the processingchamber 102. In some embodiments, the wafer stage 110 is coupled to amechanical transfer arm 148. The mechanical transfer arm 148 coupled tothe wafer stage 110 can be controlled by a control unit 150 so as toadjust the position of the wafer stage 110 in the processing chamber 102according to positions of target atoms.

The wafer stage 110 in the physical vapor deposition system 100 canfurther equipped with a plurality of temperature control elements 142.The temperature control elements 142 are controlled by a temperaturecontrol unit 144. The temperature control unit 144 can be located withina processing chamber 102 enclosed in a Faraday shield to protectelectronic circuits from RF interference or outside the processingchamber 102.

According to the exemplary embodiment described herein, the physicalvapor deposition system 100 can be used in processing the surface layersof the substrate 108. For example, any of a photoresist layer, masklayer, or other layer of a semiconductor wafer as desired, can beprocessed before or after an etch step, or any combination thereof,according to a specified recipe. The recipe also specifies parametersused to establish the proper environment in the processing chamber 102for realizing the desired features and feature dimensions on thesubstrate 108. The recipe can specify a type of reactant gas to beintroduced into the plasma chamber and its flow rate, a pressure duringreaction, a power and frequency of the RF signal provided to the plasmacathode 106 or the wafer stage 110.

The substrate 108 may be a bulk silicon substrate although othersemiconductor materials including group III, group IV, and group Velements may also be used. Alternatively, the substrate may be asilicon-on-insulator (SOI) substrate. In some embodiments, a devicelayer may be a polysilicon layer disposed on a substrate (not shown) forthe formation of one or more polysilicon gates in the substrate 108. Inanother embodiment, the device layer may be a metallization layer suchas an inter-layer dielectric (ILD) or an inter-metal dielectric layer(IMD) for forming interconnect structures (e.g., metal lines and/orvias). In yet other embodiments, the device layer may be any layer inthe substrate 108 that may be patterned using photolithography andetching processes. The substrate 108 may include numerous device layers.Furthermore, the device layer may include a buffer layer (e.g., an oxideinterfacial layer, not shown), an etch stop layer (e.g., a siliconnitride layer, a silicon carbide layer, or the like), or the like. Ahard mask may be formed over the device layer for use as a patterningmask. The hard mask may comprise an oxide, silicon oxynitride (SiON),silicon nitride (Si₃N₄), titanium nitride (TiN), or the like.

FIG. 2B illustrates a top-view of a physical vapor deposition system 100with a particle control system 160, in accordance with some embodimentsof the present disclosure. In the illustrated embodiment, the particlecontrol system 160 comprises 1 electrode pair 202. Although thedeposition system 100 comprises 1 electrode pair, it should be notedthat the deposition system 100 can comprise any number of electrodepairs 202 which is within the scope of this invention. In someembodiments, the electrode pair 202 comprises two electrodes 202A and202B. In some embodiments, the processing chamber 102 has a diameter of50-60 centimeters. In some embodiments, each of the electrodes has acircular shape and has a diameter of 10 centimeters. In someembodiments, each of the electrodes has a square shape and the size ofthe electrode is 100 square centimeters. In some embodiments, each ofthe electrode comprises at least one of the following: iron andmanganese. In some embodiments, the electrode pair 202 is arrangedaround the target 104 in the processing chamber 102 and has a 2-foldrotational symmetry about the center of the processing chamber 102. Insome embodiments, the deposition system 100 comprises at least onetarget 104 at the center of the processing chamber 102. In someembodiments, the deposition system 100 comprises a wafer stage 110 witha substrate 108. In some embodiments, the wafer stage 110 is off thecenter of the processing chamber 102 and located at the right side ofthe processing chamber in a top view so as to collect target atoms 124that are shifted by the electric field 206 generated by the electrodepair 202.

As discussed above in FIGS. 1 and 2, the control units 140, 144, 150,and 208 are representative devices and each may comprise a processor, amemory, an input/output interface, a communications interface, and asystem bus. The processor may comprise any processing circuitryoperative to control the operations and performance of the control units140, 144, 150, and 208. In various aspects, the processor may beimplemented as a general purpose processor, a chip multiprocessor (CMP),a dedicated processor, an embedded processor, a digital signal processor(DSP), a network processor, an input/output (I/O) processor, a mediaaccess control (MAC) processor, a radio baseband processor, aco-processor, a microprocessor such as a complex instruction setcomputer (CISC) microprocessor, a reduced instruction set computing(RISC) microprocessor, and/or a very long instruction word (VLIW)microprocessor, or other processing device. The processor also may beimplemented by a controller, a microcontroller, an application specificintegrated circuit (ASIC), a field programmable gate array (FPGA), aprogrammable logic device (PLD), and so forth.

In various aspects, the processor may be arranged to run an operatingsystem (OS) and various applications. Examples of an OS comprise, forexample, operating systems generally known under the trade name of AppleOS, Microsoft Windows OS, Android OS, and any other proprietary or opensource OS. Examples of applications comprise, for example, a telephoneapplication, a camera (e.g., digital camera, video camera) application,a browser application, a multimedia player application, a gamingapplication, a messaging application (e.g., email, short message,multimedia), a viewer application, and so forth.

In some embodiments, at least one non-transitory computer-readablestorage medium is provided having computer-executable instructionsembodied thereon, wherein, when executed by at least one processor, thecomputer-executable instructions cause the at least one processor toperform embodiments of the methods described herein. Thiscomputer-readable storage medium can be embodied in the memory.

In some embodiments, the memory may comprise any machine-readable orcomputer-readable media capable of storing data, including bothvolatile/non-volatile memory and removable/non-removable memory. Thememory may comprise at least one non-volatile memory unit. Thenon-volatile memory unit is capable of storing one or more softwareprograms. The software programs may contain, for example, applications,user data, device data, and/or configuration data, or combinationstherefore, to name only a few. The software programs may containinstructions executable by the various components of the control units140, 144, 150, and 208.

For example, memory may comprise read-only memory (ROM), random-accessmemory (RAM), dynamic RAM (DRAM), Double-Data-Rate DRAM (DDR-RAM),synchronous DRAM (SDRAM), static RAM (SRAM), programmable ROM (PROM),erasable programmable ROM (EPROM), electrically erasable programmableROM (EEPROM), flash memory (e.g., NOR or NAND flash memory), contentaddressable memory (CAM), polymer memory (e.g., ferroelectric polymermemory), phase-change memory (e.g., ovonic memory), ferroelectricmemory, silicon-oxide-nitride-oxide-silicon (SONOS) memory, disk memory(e.g., floppy disk, hard drive, optical disk, magnetic disk), or card(e.g., magnetic card, optical card), or any other type of media suitablefor storing information.

In one embodiment, the memory may contain an instruction set, in theform of a file for executing a method of generating one or more timinglibraries as described herein. The instruction set may be stored in anyacceptable form of machine-readable instructions, including source codeor various appropriate programming languages. Some examples ofprogramming languages that may be used to store the instruction setcomprise, but are not limited to: Java, C, C++, C #, Python,Objective-C, Visual Basic, or .NET programming. In some embodiments acompiler or interpreter is comprised to convert the instruction set intomachine executable code for execution by the processor.

In some embodiments, the I/O interface may comprise any suitablemechanism or component to at least enable a user to provide input to thecontrol units 140, 144, 150, and 208, and the control units 140, 144,150, and 208 to provide output to the user. For example, the I/Ointerface may comprise any suitable input mechanism, including but notlimited to, a button, keypad, keyboard, click wheel, touch screen, ormotion sensor. In some embodiments, the I/O interface may comprise acapacitive sensing mechanism, or a multi-touch capacitive sensingmechanism (e.g., a touchscreen).

In some embodiments, the I/O interface may comprise a visual peripheraloutput device for providing a display visible to the user. For example,the visual peripheral output device may comprise a screen such as, forexample, a Liquid Crystal Display (LCD) screen, incorporated into thecontrol units 140, 144, 150, and 208. As another example, the visualperipheral output device may comprise a movable display or projectingsystem for providing a display of content on a surface remote from thecontrol units 140, 144, 150, and 208. In some embodiments, the visualperipheral output device can comprise a coder/decoder, also known as aCodec, to convert digital media data into analog signals. For example,the visual peripheral output device may comprise video Codecs, audioCodecs, or any other suitable type of Codec.

The visual peripheral output device also may comprise display drivers,circuitry for driving display drivers, or both. The visual peripheraloutput device may be operative to display content under the direction ofthe processor. For example, the visual peripheral output device may beable to play media playback information, application screens forapplications implemented on the control units 140, 144, 150, and 208,information regarding ongoing communications operations, informationregarding incoming communications requests, or device operation screens,to name only a few.

In some embodiments, the communications interface may comprise anysuitable hardware, software, or combination of hardware and softwarethat is capable of coupling the control units 140, 144, 150, and 208 toone or more networks and/or additional devices. The communicationsinterface may be arranged to operate with any suitable technique forcontrolling information signals using a desired set of communicationsprotocols, services or operating procedures. The communicationsinterface may comprise the appropriate physical connectors to connectwith a corresponding communications medium, whether wired or wireless.

Systems and methods of communication comprise a network, in accordancewith some embodiments. In various aspects, the network may compriselocal area networks (LAN) as well as wide area networks (WAN) includingwithout limitation Internet, wired channels, wireless channels,communication devices including telephones, computers, wire, radio,optical or other electromagnetic channels, and combinations thereof,including other devices and/or components capable of/associated withcommunicating data. For example, the communication environments comprisein-body communications, various devices, and various modes ofcommunications such as wireless communications, wired communications,and combinations of the same.

Wireless communication modes comprise any mode of communication betweenpoints (e.g., nodes) that utilize, at least in part, wireless technologyincluding various protocols and combinations of protocols associatedwith wireless transmission, data, and devices. The points comprise, forexample, wireless devices such as wireless headsets, audio andmultimedia devices and equipment, such as audio players and multimediaplayers, telephones, including mobile telephones and cordlesstelephones, and computers and computer-related devices and components,such as printers, network-connected machinery, and/or any other suitabledevice or third-party device.

Wired communication modes comprise any mode of communication betweenpoints that utilize wired technology including various protocols andcombinations of protocols associated with wired transmission, data, anddevices. The points comprise, for example, devices such as audio andmultimedia devices and equipment, such as audio players and multimediaplayers, telephones, including mobile telephones and cordlesstelephones, and computers and computer-related devices and components,such as printers, network-connected machinery, and/or any other suitabledevice or third-party device. In various implementations, the wiredcommunication modules may communicate in accordance with a number ofwired protocols. Examples of wired protocols may comprise UniversalSerial Bus (USB) communication, RS-232, RS-422, RS-423, RS-485 serialprotocols, FireWire, Ethernet, Fiber Channel, MIDI, ATA, Serial ATA, PCIExpress, T-1 (and variants), Industry Standard Architecture (ISA)parallel communication, Small Computer System Interface (SCSI)communication, or Peripheral Component Interconnect (PCI) communication,to name only a few examples.

Accordingly, in various aspects, the communications interface maycomprise one or more interfaces such as, for example, a wirelesscommunications interface, a wired communications interface, a networkinterface, a transmit interface, a receive interface, a media interface,a system interface, a component interface, a switching interface, a chipinterface, a controller, and so forth. When implemented by a wirelessdevice or within wireless system, for example, the communicationsinterface may comprise a wireless interface comprising one or moreantennas, transmitters, receivers, transceivers, amplifiers, filters,control logic, and so forth.

In various embodiments, the communications interface may provide voiceand/or data communications functionality in accordance a number ofwireless protocols. Examples of wireless protocols may comprise variouswireless local area network (WLAN) protocols, including the Institute ofElectrical and Electronics Engineers (IEEE) 802.xx series of protocols,such as IEEE 802.11a/b/g/n, IEEE 802.16, IEEE 802.20, and so forth.Other examples of wireless protocols may comprise various wireless widearea network (WWAN) protocols, such as GSM cellular radiotelephonesystem protocols with GPRS, CDMA cellular radiotelephone communicationsystems with 1×RTT, EDGE systems, EV-DO systems, EV-DV systems, HSDPAsystems, and so forth. Further examples of wireless protocols maycomprise wireless personal area network (PAN) protocols, such as anInfrared protocol, a protocol from the Bluetooth Special Interest Group(SIG) series of protocols, including Bluetooth Specification versionsv1.0, v1.1, v1.2, v2.0, v2.0 with Enhanced Data Rate (EDR), as well asone or more Bluetooth Profiles, and so forth. Yet another example ofwireless protocols may comprise near-field communication techniques andprotocols, such as electromagnetic induction (EMI) techniques. Anexample of EMI techniques may comprise passive or active radio-frequencyidentification (RFID) protocols and devices. Other suitable protocolsmay comprise Ultra Wide Band (UWB), Digital Office (DO), Digital Home,Trusted Platform Module (TPM), ZigBee, and so forth.

In some embodiments, the control units 140, 144, 150, and 208 maycomprise a system bus that couples various system components includingthe processor, the memory, and the I/O interface. The system bus can beany of several types of bus structure(s) including a memory bus ormemory controller, a peripheral bus or external bus, and/or a local bususing any variety of available bus architectures including, but notlimited to, 9-bit bus, Industrial Standard Architecture (ISA),Micro-Channel Architecture (MCA), Extended ISA (EISA), Intelligent DriveElectronics (IDE), VESA Local Bus (VLB), Personal Computer Memory CardInternational Association (PCMCIA) Bus, Small Computer System Interface(SCSI) or other proprietary bus, or any custom bus suitable forcomputing device applications.

FIG. 3 illustrates a flowchart of a method 300 for removingcontamination particles using a particle control system 160 in aphysical vapor deposition process, in accordance with some embodimentsof the present disclosure. It is understood that additional operationsmay be provided before, during, and after the method 300 of FIG. 3, andalso some operations may be omitted or reordered.

The method 300 starts with operation 302 in which a plasma is generatedin a processing chamber 102 according to some embodiments. In someembodiments, the plasma is generated on a plasma cathode 106 with atarget 104. In some embodiments, before generating the plasma, processgas (e.g., Ar) is added to the processing chamber 102 through at leastone gas-feeding port 120 and pumped out by a pump through at least onevacuum port 122 to prepare the processing chamber 102 to a desiredpressure. In some embodiments, the desired pressure is in a pressure ofa few millitorr (mTorr) to a few Torr. In some other embodiments, the atleast one plasma cathode 106 is coupled to a radio frequency (RF) powersource and a respective matching circuit (not shown) operating atfrequencies from a few tens of kilohertz (KHz) to tens of megahertz(MHz). By applying a power on the at least one plasma cathode 106, aplasma 128 (i.e., a gas that contains ionized atoms or molecules) can beformed in a space in the processing chamber 102 near the at least onetarget 104. In some embodiments, technologies, such as for instanceinductively coupled plasma, electron cyclotron resonance, microwave, andhelicon wave can be integrated with the RF source for a creation ofhigh-density discharges for desired deposition properties. In someembodiments, the physical vapor deposition system can be a DC magnetronsputtering system configured in a cathode target/anodic shieldarrangement, wherein the at least one plasma cathode 106 and anode (notshown) are connected to a DC discharge power supply 112. In someembodiments, the at least one target 104 and the at least onecorresponding plasma cathode 106 can be cooled by a coolant runningbehind the target 104.

The method 300 continues with operation 304 in which a particle controlsystem 160 is enabled to remove contamination particles from depositingon a substrate 108 according to some embodiments. In some embodiments,the particle control system 160 comprises at least one magnet pair 130configured inside the processing chamber 102. In some embodiments, theat least one magnet pair 130 each comprises two electromagnets 130A and130B with magnetic coils configured facing each other on the oppositeside of the processing chamber 102. Each of the electromagnets comprisea conductive wire coil that acts as a magnet when an electric currentpasses through it. In some embodiments, the conductive wire coil iswrapped around a core of ferromagnetic materials which can be used toenhance the magnetic field produced by the coil. In some embodiments,the at least one magnet pair 130 is coupled to a power source 138 andfurther to a control unit 140. In some embodiments, the control unit 140and the power source 138 are configured to control a magnitude and adirection of an electric current running through the magnetic coils ofthe two electromagnets 130A/130B in each of the at least one magnet pair130 to adjust a strength and a direction of the magnetic field 132. Amagnetic force is induced by the magnetic field 132 on a moving andcharged particle from the target 104. For example, a target atom 124 fordeposition on the substrate 108 and a contamination particle 126 arebombarded off the surface of the target 104. In some embodiments, thetarget atom 124 and the contamination particle 126 each has an initialtrajectory 146 without a magnetic field 132. When the magnetic field 132with a direction from a first electromagnet 130A to a secondelectromagnet 130B is enabled, the target atom 124 and the contaminationparticle 126 change from the first trajectory to a second trajectory 134and 136, respectively. The difference between the original trajectoryand the second trajectory of the target atom 124 is greater than that ofthe contamination particle 126 caused by differences between the 2particles, e.g., mass and electric charges. Therefore, the magneticforce can separate contamination particles from the rest of the targetatoms 124. In some embodiments, the magnet pairs are arranged around theinner wall of the processing chamber 102 and each of the magnetic pairs130 has a 2-fold rotational symmetry about the center of the processingchamber 102. In some embodiments, at least one target 104 is located atthe center of the processing chamber 102. In some embodiments, the waferstage 110 with a substrate 108. is off the center of the processingchamber 102 and located at the top of the processing chamber in a topview so as to collect target atoms that are shifted by the magneticfield 132 generated by the magnet pairs 130.

In some other embodiments, the particle control system 160 comprises atleast one electrode pair 202 configured inside the processing chamber102. In some embodiments, the at least one electrode pair 202 eachcomprises two electrodes 202A and 202B with electrodes configured facingeach other on the opposite side of the processing chamber 102. Each ofthe electrode pair 202 acts as a capacitor when an electric potential isapplied between the two electrodes. In some embodiments, the at leastone electrode pair 202 is coupled to a power source 204 and further to acontrol unit 208. In some embodiments, the control unit 208 and thepower source 204 are configured to control a magnitude and a polarity ofthe electric potential so as to control a strength and a direction of anelectric field between the two electrodes 202A/202B. An electrostaticforce is induced by the 2 electrodes on a moving and charged particlefrom the target 104. For example, the target atom 124 for deposition onthe substrate 108 and the contamination particle 126 are bombarded offthe surface of the target 104. In some embodiments, the target atom 124and the contamination particle 126 each has an initial trajectory 146when there is no electric field 206 is provided by the 2 electrodes202A/202B. When the electric field 206 with a direction from a firstelectrode 202A to a second electrode 202B is enabled, both of the targetatom 124 and the contamination particle 126 change from the firsttrajectory 146 to a second trajectory 134 and 136, respectively. Thedifference between the original trajectory and the second trajectory ofthe target atom 124 is greater than that of the contamination particle126 caused by differences between the 2 particles, e.g., mass andelectric charges. Therefore, the electrostatic force can change theoriginal trajectories of charged particles and thus separatecontamination particles from the rest of the target atoms 124.

The method 300 continues with operation 306 in which a deposition of afilm is performed on the substrate 108 according to some embodiments. Insome embodiments, the film deposited on the substrate 108 comprises atleast one element from the target 104. In some embodiments, a number ofdefects in the film caused by contamination particles 126 is reduced bythe particle control system 160 in the present disclosure. In someembodiments, the particle control system 160 provides an efficientseparation of contamination particles from the target atoms and togetherwith the positioning of the substrate, it can further allow target atomsto reach the surface of the substrate. The substrate 108 may be a bulksilicon substrate although other semiconductor materials including groupIII, group IV, and group V elements may also be used. Alternatively, thesubstrate 108 may be a silicon-on-insulator (SOI) substrate. In someembodiments, a device layer may be a polysilicon layer disposed on asubstrate (not shown) for the formation of one or more polysilicon gatesin the substrate 108. In another embodiment, the device layer may be ametallization layer such as an inter-layer dielectric (ILD) or aninter-metal dielectric layer (IMD) for forming interconnect structures(e.g., metal lines and/or vias). In yet other embodiments, the devicelayer may be any layer in the substrate 108 that may be patterned usingphotolithography and etching processes. The substrate 108 may includenumerous device layers. Furthermore, the device layer may include abuffer layer (e.g., an oxide interfacial layer, not shown), an etch stoplayer (e.g., a silicon nitride layer, a silicon carbide layer, or thelike), or the like. A hard mask may be formed over the device layer foruse as a patterning mask. The hard mask may comprise an oxide, siliconoxynitride (SiON), silicon nitride (Si₃N₄), titanium nitride (TiN), orthe like.

The preceding merely illustrates the principles of the disclosure. Itwill thus be appreciated that those of ordinary skill in the art will beable to devise various arrangements which, although not explicitlydescribed or shown herein, embody the principles of the disclosure andare included within its spirit and scope. Furthermore, all examples andconditional language recited herein are principally intended expresslyto be only for pedagogical purposes and to aid the reader inunderstanding the principles of the disclosure and the inventiveconcepts, and are to be construed as being without limitation to suchspecifically recited examples and conditions. Moreover, all statementsherein reciting principles, aspects, and embodiments of the disclosure,as well as specific examples thereof, are intended to encompass bothstructural and functional equivalents thereof. Additionally, it isintended that such equivalents include both currently known equivalentsand equivalents developed in the future, i.e., any elements developedthat perform the same function, regardless of structure.

This description of the exemplary embodiments is set to be understood inconnection with the figures of the accompanying drawing, which are to beconsidered part of the entire written description. In the description,relative terms such as “lower,” “upper,” “horizontal,” “vertical,”“above,” “below,” “up,” “down,” “top” and “bottom” as well asderivatives thereof (e.g., “horizontally,” “downwardly,” “upwardly,”etc.) should be construed to refer to the orientation as then describedor as shown in the drawing under discussion. These relative terms arefor convenience of description and do not require that the apparatus beconstructed or operated in a particular orientation.

In an embodiment, a film deposition system includes: a processingchamber sealable to create a pressurized environment and configured tocontain a plasma, a target and a substrate in the pressurizedenvironment; and a particle control unit, wherein the particle controlunit is configured to provide an external force to each of at least onecharged atom and at least one contamination particle in the plasma,wherein the at least one charged atom and the at last one contaminationparticle are generated by the target when it is in direct contact withthe plasma, wherein the external force is configured to direct the atleast one charged atom to a top surface of the substrate and to directthe at least one contamination particle away from the top surface of thesubstrate.

In another embodiment, a method for particle control in a filmdeposition system includes: providing a plasma to be in direct contactwith at least one target in a processing chamber, thereby generating atleast one charged atom and at least one contamination particle;generating an external force on each of the at least one charged atomand the at least one contamination particle in the plasma so as todirect the at least one charged atom to a substrate; and directing theat least one charged atom onto a surface of the substrate at a firstposition, wherein the first position is configured by a substrate stagelocated off-center of the processing chamber.

Yet in another embodiment, a film deposition system, includes: aprocessing chamber sealable to create a pressurized environment andconfigured to contain a plasma, a target and a substrate in thepressurized environment; and a particle control unit, wherein theparticle control unit is configured to provide an external force to eachof at least one charged atom and at least one contamination particle inthe plasma, wherein the at least one charged atom and the at last onecontamination particle are generated by the target when it is in directcontact with the plasma, wherein the external force is configured todirect the at least one charged atom to a top surface of the substrateand to direct the at least one contamination particle away from the topsurface of the substrate, wherein the substrate is supported by a stagethat is off-center from a center of the processing chamber, and whereinthe particle control unit comprises one of the following: at least onepair of electromagnetic coils and at least one pair of conductiveelectrodes.

Although the disclosure has been described in terms of exemplaryembodiments, it is not limited thereto. Rather, the appended claimsshould be construed broadly, to include other variants and embodimentsof the disclosure, which may be made by those of ordinary skill in theart without departing from the scope and range of equivalents of thedisclosure.

What is claimed is:
 1. A film deposition system comprising: a processingchamber sealable to create a pressurized environment and configured tocontain a plasma, a target and a substrate in the pressurizedenvironment; and a particle control unit, wherein the particle controlunit is configured to provide an external force to each of at least onecharged atom and at least one contamination particle in the plasma,wherein the particle control unit comprises at least one pair ofconductive electrodes, and wherein the at least one pair of conductiveelectrodes is configured to provide an electric field between a firstconductive electrode and a second conductive electrode in the particlecontrol unit.
 3. The system of claim 1, wherein the at least one pair ofconductive electrodes comprises at least one of the following: iron andmanganese.
 4. The system of claim 1, wherein the at least one pair ofconductive electrodes is configured near the at least one target in a2-fold rotational symmetry about the center of the processing chamber.5. The system of claim 1, wherein the at least one pair of conductiveelectrodes has a shape of one of the following: square and circular. 6.The system of claim 1, wherein the at least one charged atom and the atlast one contamination particle are generated by the target when it isin direct contact with the plasma.
 7. The system of claim 1, wherein theexternal force is configured to direct the at least one charged atom toa top surface of the substrate and to direct the at least onecontamination particle away from the top surface of the substrate.
 8. Amethod for particle control in a film deposition system comprising:providing a plasma to be in direct contact with at least one target in aprocessing chamber, thereby generating at least one charged atom;generating an external force on the at least one charged atom in theplasma so as to direct the at least one charged atom to a substrate; anddirecting the at least one charged atom onto a surface of the substrateat a first position, wherein the first position is configured by asubstrate stage located off-center of the processing chamber.
 9. Themethod of claim 8, wherein the external force is provided by one of thefollowing: at least one pair of electromagnetic coils or at least onepair of conductive electrodes.
 10. The method of claim 9, wherein the atleast one pair of electromagnetic coils or the at least one pair ofconductive electrodes comprises at least one of the following: iron andmanganese.
 11. The method of claim 9, wherein the at least one pair ofelectromagnetic coils or the at least one pair of conductive electrodesis configured near the at least one target with a 2-fold rotationalsymmetry about the center of the processing chamber.
 12. The method ofclaim 9, wherein the at least one pair of electromagnetic coils or theat least one pair of conductive electrodes has a shape of one of thefollowing: square and circular.
 13. The method of claim 9, wherein theat least one pair of conductive electrodes is configured to provide anelectric field between a first conductive electrode and a secondconductive electrode in the particle control unit.
 14. The method ofclaim 9, wherein the at least one pair of electromagnetic coils isconfigured to provide a magnetic field between a first electromagneticcoil and a second electromagnetic coil.
 15. A film deposition systemcomprising: a processing chamber sealable to create a pressurizedenvironment and configured to contain a plasma, a target and a substratein the pressurized environment; and a particle control unit, wherein theparticle control unit is configured to provide an external force to atleast one charged atom in the plasma, wherein the external force isconfigured to direct the at least one charged atom to a top surface ofthe substrate, wherein the substrate is supported by a stage that isoff-center from a center of the processing chamber, wherein the particlecontrol unit is further configured to provide an electric field betweena first conductive electrode and a second conductive electrode in theparticle control unit.
 16. The system of claim 15, wherein the particlecontrol unit comprises one of the following: at least one pair ofelectromagnetic coils or at least one pair of conductive electrodes, andwherein the at least one pair of electromagnetic coils or the at leastone pair of conductive electrodes comprises at least one of thefollowing: iron and manganese.
 17. The system of claim 15, wherein theat least one pair of electromagnetic coils or the at least one pair ofconductive electrodes is configured near the at least one target in a2-fold rotational symmetry about the center of the processing chamber.18. The system of claim 15, wherein the at least one pair ofelectromagnetic coils or the at least one pair of conductive electrodeshas a shape of one of the following: square and circular.
 20. The systemof claim 15, wherein the at least one pair of electromagnetic coils isconfigured to provide a magnetic field between a first electromagneticcoil and a second electromagnetic coil.